RG
6714433044
Plasma Etch MK II Industrial Plasma Etching System, 2017
$72,500.00
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Process Temperature Control: 125F – 300F + – 5F
Electrostatic Shielding
6 Level Horizontal Planar Electrode Configuration
24″W x 18″D, 1.50″ Spacing
Color Touch Screen PC Control System
Intuitive Custom Plasma Etch, INC. Software
1200W 13.56 MHz Solid State RF Generator
Automatic RF Matching Network
30CFM Oxygen Service Vacuum Booster
2-2000 SCCM Mass Flow Controllers, 2 Gas Channels
Automatic Nitrogen Purging for Vacuum Pump
Oil Mist Coalescing Filter on Vacuum Pump Exhaust