Plasma Etch MK II Industrial Plasma Etching System, 2017

$72,500 Submit a quote request to instantly see pricing

Machine Type:

Process Equipment

Make:

Plasma Etch

Model:

MK II

Year:

2017

SPECIFICATIONS

Process Temperature Control: 125F - 300F + - 5F

Electrostatic Shielding

6 Level Horizontal Planar Electrode Configuration

24"W x 18"D, 1.50" Spacing

Color Touch Screen PC Control System

Intuitive Custom Plasma Etch, INC. Software

1200W 13.56 MHz Solid State RF Generator

Automatic RF Matching Network

30CFM Oxygen Service Vacuum Booster

2-2000 SCCM Mass Flow Controllers, 2 Gas Channels

Automatic Nitrogen Purging for Vacuum Pump

Oil Mist Coalescing Filter on Vacuum Pump Exhaust

All specifications are assumed to be correct but must be confirmed by the purchasing entity.

312-761-9396 | 917 W. 18th St., STE 202 (Office #4) Chicago, IL 60608-2400