Trion Technology Phantom Rie Plasma Etch and Orion III Plasma Enhanced Chemical Vapor Deposition, 2020

Phatom LT Rie System
– Reactor with 8” bottom electrode
– System controller includes Pentium based computer and touchscreen interface
– Two mass flow controllers (O2, CF4)
Automatic tuning with 13.56 MHz 600 RF generator
-Automatic pressure control package (butterfly valve with
capacitance manometer for pressure measurement)
– 60 com non-corrosive dry pump
– Recirculating temperature controller (chiller)

Orion III PECVD System
– Orion Ill reactor with 200mm
-Radially designed high conductance plenum and vacuum
-System controler (includes Pentium computer and touchscreen
interface) -Four mass flow controllers
-Automatic pressure control
-300 Watt, 350 kHz solid state power supply
-Heated lower electrode (controlled 50-400C)
-Emergency Of and AC distribution-
– 27 com Rotaty Vane pump with oil filtration, demister and Fumbling oil
– Wall mount MFC cabinet with blank slot for future N20 MFC